SHS Web Conf.
Volume 163, 20232023 8th International Conference on Social Sciences and Economic Development (ICSSED 2023)
|Number of page(s)
|Corporate Decision Making and Brand Operations Sales
|28 April 2023
The Development of Photolithographic Technology and Machines
Guangzhou International Campus, South China University of Technology, Guangzhou, Guangdong, China
* Corresponding author: firstname.lastname@example.org
Photolithography is the most complicated, accurate, expensive process in the manufacture of integrated circuits. The lithography machine is one of the most critical equipment in photolithographic process, which is used to duplicate the circuit construction onto the wafer. DUVL is the dominant photolithography technology at present for technology node among 714nm, while EUVL has been applied in the manufacture of semiconductor devices for the technology node beyond 7nm. The main components of EUVL are light source, objective lens system and countertop. This paper will introduce the function, main components, exposure method, light source and the future development of lithographic technology.
© The Authors, published by EDP Sciences, 2023
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