Open Access
SHS Web Conf.
Volume 163, 2023
2023 8th International Conference on Social Sciences and Economic Development (ICSSED 2023)
Article Number 03021
Number of page(s) 4
Section Corporate Decision Making and Brand Operations Sales
Published online 28 April 2023
  1. Wu, B. and A. Kumar, Extreme ultraviolet lithography: A review. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2007. 25(6). [Google Scholar]
  2. Wu, B. and A. Kumar, Extreme ultraviolet lithography and three dimensional integrated circuit—A review. Applied Physics Reviews, 2014. 1(1). [Google Scholar]
  3. Kim, J.S. and J. Ahn, Mask Materials and Designs for Extreme Ultra Violet Lithography. Electronic Materials Letters, 2018. 14(5): p. 533–547. [CrossRef] [Google Scholar]
  4. Tani, T. and T. Kozawa, Resist Materials and Processes for Extreme Ultraviolet Lithography. Japanese Journal of Applied Physics, 2013. 52(1R). [Google Scholar]
  5. T.-G. Kim et al., “Damage Free Particle Removal from EUVL Mask Layers by High Energy Laser Shock Cleaning (LSC),” 2007 Digest of papers Microprocesses and Nanotechnology, Kyoto, Japan, 2007, pp. 48–49, DOI: 10.1109/IMNC.2007.4456098. [CrossRef] [Google Scholar]
  6. M. D. Fields, S. S. Harilal and A. Hassanein, “The role of excitation wavelength on debris for Co2 and Nd:YAG laser-produced plasma EUVL sources,” 2011 Abstracts IEEE International Conference on Plasma Science, Chicago, IL, USA, 2011, pp. 1–1, DOI: 10.1109/PLASMA.2011.5993267. [Google Scholar]
  7. S. Lim, S. Kitajima, T. Sakugawa, H. Akiyama and S. Katsuki, “The effects of tin droplets on the EUV emission after laser-triggered discharge for EUVL,” 2014 IEEE 41st International Conference on Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS), Washington, DC, USA, 2014, pp. 1–1, DOI: 10.1109/PLASMA.2014.7012274. [Google Scholar]

Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.

Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.

Initial download of the metrics may take a while.