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Cited article:

Recent Progress of Nonchemically‐Amplified Resists for High‐Resolution Lithography†

Hao Li, Rongrong Peng, Zhuoran Liu, Peng Lian, Jinping Chen, Tianjun Yu, Yi Zeng, Shuangqing Wang, Xudong Guo, Rui Hu, Guoqiang Yang and Yi Li
Chinese Journal of Chemistry (2026)
https://doi.org/10.1002/cjoc.70573

Experimental Study on the Temporal Evolution Parameters of Laser–Produced Tin Plasma under Different Laser Pulse Energies for LPP–EUV Source

Yiyi Chen, Chongxiao Zhao, Qikun Pan, Ranran Zhang, Yang Gao, Xiaoxi Li, Jin Guo and Fei Chen
Photonics 10 (12) 1339 (2023)
https://doi.org/10.3390/photonics10121339